The wafer probe station should be placed on a stable and reliable table, preferably on a worktable with anti-vibration device, and avoid using it under high temperature, humidity, violent vibration, direct sunlight and dusty environments.

　　The best temperature range for use is 5℃～40℃, and the best humidity is 40% to 85%. If the humidity in the air is below 30%, a reliable humidity controller can control it to maintain the range of 50%～60%. When in use, close doors and windows as much as possible to achieve dehumidification effect in the room.

　　Power supply: 220±10%, 50~60Hz

　　 After use, you need to keep it clean and try to dry the dust as much as possible to prevent the dust from contaminating the mechanical precision parts, optical parts, and electrical contact surfaces, which will reduce the accuracy of the instrument.

　　 When cleaning the body of the wafer probe station, avoid directly splashing water to clean it, just wipe it lightly with a dust-free cloth and dry it. Do not touch the machine with hard objects to avoid malfunction or danger.

　　 When cleaning the optical components of the wafer probe station, use lens paper dipped in absolute alcohol to gently wipe from the middle to the outside. When anhydrous alcohol is flammable, pay attention to safe use.

　　 Please unplug the power cord to maintain the life of the machine when it is out of power, unused for a long time, or traveling.

　　The operator must operate strictly as required to ensure the accuracy of the data and the normal use of the instrument.